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Chronicles

The story behind the story

days · browse · Enter similar · o open

ASML opens a test laboratory for its High NA EUV machine with Belgium's Imec in the Netherlands, and expects customers to start manufacturing in 2025 to 2026

Toby Sterling / Reuters :

Reuters Toby Sterling

Context & Ripple Effects

The lab moves High NA EUV from ASML’s shipment-preparation phase toward shared process development with Imec. Earlier coverage showed ASML gearing up to ship the first High NA systems, making access to a test environment a practical bridge between tool delivery and fab deployment.

It matters because the reported 2025–26 production window makes customer learning cycles, rather than machine availability alone, central to adoption. Later reporting that five units had shipped and the systems exceeded $400 million underscores the unusually high stakes of High NA’s early rollout.

First-order effects

  • Imec and prospective chipmakers gain a Netherlands-based environment to test High NA EUV processes before committing the machines to volume production.
  • ASML adds an application-development step around its new platform, supporting its expectation that customers will begin manufacturing with High NA EUV in 2025–26.

Second-order effects

  • Customers can use shared test work to reduce integration risk, but the long qualification cycle may concentrate early adoption among fabs able to absorb expensive tooling and process-development costs.
  • ASML’s near-term competitive task shifts from delivering machines to proving repeatable manufacturing results; demand timing will depend on those results as well as shipments.

Third-order effects

  • If this model succeeds, leading-edge lithography will be sold increasingly as a coordinated ecosystem of tool access, process expertise and customer qualification—not as a standalone capital-equipment purchase.
  • The story fits a broader semiconductor-capacity constraint: the pace of advanced-node expansion is shaped by scarce, complex production tools and the time needed to operationalize them.

The trend: High NA EUV is entering the qualification stage in which collaborative process development determines how quickly frontier lithography becomes volume manufacturing capacity.

Discussion

  • @intel @intel on x
    @ASMLcompany Huge day for chip-making! We're thrilled to see this vision come to life and accelerate the next generation of chips together.
  • @iancutress @iancutress on x
    Breaking news: @imec_int and @ASMLcompany create a new high-NA lab to derisk the technology for high volume manufacturing. Imec will enable partners access to prototype tools and ASML's high NA EUV machine for testing/prep before buying a full machine. https://www.imec-int.com/..…
  • @asmlcompany @asmlcompany on x
    We just opened our High NA EUV Lab! ⚙️ Here the industry can experiment with and optimize chip manufacturing on a High NA EUV system. Working with this technology now will help drive Moore's Law into the Angstrom era. @imec_int @intel Read more: https://www.asml.com/... [image]
  • @imec_int @imec_int on x
    #PR Today, imec & @ASMLcompany brought their partnership to the next level with the opening of its joint High NA EUV Lithography Lab. This collaboration marks a milestone in preparing High NA EUV lithography for accelerated adoption in mass manufacturing. https://www.imec-int.com…